Advanced Nanoscience and Technology: An International Journal (ANTJ)

ISSN : 2455-2941

Scope and Topics

Advanced Nanoscience and Technology: An International Journal (ANTJ) is a peer-reviewed, open access journal, addresses the impacts and challenges of Nanoscience and Technology. The journal documents practical and theoretical results which make a fundamental contribution for the development of Nanoscience and Technology.

Topics of interest include but are not limited to, the following

• Micro / Nano Fabrication and Metrology
• Micro / Nano Heat Transfer and Energy Information Technology,
• Micro / Nano Sensors , Actuators and Systems Nanobionics
• Micro / Nanofluidics and Bio Chips
• Modeling and Simulation
• Molecular Sensors, Actuators and Systems
• Nano and Molecular systems
• Nano Robotics, Assembly and Automation
• Nano‐bio‐informatics, Nanomedicine
• Nanobiology / Nanobiomechanics / Nanobiotechnologies
• Nanocatalysis
• Nanoelectronics
• Nano-Graphene
• Nanomaterials, Nanodevices: Fabrication, Characterization and Application
• Nanomedical Applications: Drug Delivery, and Tissue Engineering
• Nanophotonics
• Nanotechnology and Agriculture / Coating / Education / Energy
• Nanotechnology and Environment / Polymer
• Nanotechnology, Products and Markets
• Societal aspects of Nanotechnology: Ethics, Risk Assessment, Standardization

Paper Submission

Authors are invited to submit papers for this journal through E-mail antj_journal@airccse.com. Submissions must be original and should not have been published previously or be under consideration for publication while being evaluated for this Journal.

Important Dates

Editorial in Chief

• Qing Wang, Shandong University of Science and Technology, China

Editorial Board Members

• Ala'eddin A. Saif, Universiti Malaysia Perlis, Malaysia
• Antonio Ruotolo, City University of Hong Kong, Hong Kong
• Arpita Yadav, University Institute of Engineering & Technology, India
• Atanu Nag, Modern Institute of Engineering & Technology, India
• Bhanu Pratap Singh, CSIR-National Physical Laboratory, India
• Chandan Hait, NIMS Institute of Engineering & Technology, India
• Chang Ming Li, Southwest University, China
• Chong Leong Gan,Chong Leong Gan, Broadcom Limited, Malaysia
• Denis Garoli,Istituto Italiano di Tecnologia (IIT), Italy
• Elena N. Domoroshchina, Lomonosov Moscow State University of Fine Chemical Technologies, Russia
• Evgeny L. Pankratov, Nizhny Novgorod State Univercity, Russia

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